Rapid analysis of sipos films by elastic backscattering and RBS
- 1 April 1986
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 15 (1-6) , 275-279
- https://doi.org/10.1016/0168-583x(86)90302-2
Abstract
No abstract availableKeywords
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- Electrically-alterable read-only-memory using Si-rich SiO2 injectors and a floating polycrystalline silicon storage layerJournal of Applied Physics, 1981
- Highly reliable high-voltage transistors by use of the SIPOS processIEEE Transactions on Electron Devices, 1976
- Semi-Insulating Polycrystalline-Silicon (SIPOS) Films Applied to MOS Integrated CircuitsJapanese Journal of Applied Physics, 1976