Dynamic corrections in MEBES 4500

Abstract
Some systematic errors of the mebes raster scan lithography system are examined and how significant accuracy improvements can be achieved is demonstrated. The accuracy improvements result from error compensation hardware and software applying corrections that are either a function of time (write scan position) or of position on the substrate. Error analysis shows the following correctable errors to be among the largest error sources in the mebes iv: electronic noise, stage z runout, deflection alignment drift, mask flatness, and clamping distortion, and scan nonlinearity. These errors contribute to placement/overlay accuracy and to butting accuracy. The dynamic corrections implemented are automatic write scan correction, which reduces deflection alignment errors, scan linearity measurement and correction, grid correction, and height detection and correction, which reduce cassette height and mask flatness errors. With these corrections implemented, system performance improves dramatically.

This publication has 0 references indexed in Scilit: