Electron and chemical kinetics in methane rf glow-discharge deposition plasmas

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Abstract
Experimental measurements and theoretical modeling of methane deposition plasmas have led to the identification of the most likely homogeneous and heterogeneous reaction paths leading to the deposition of amorphous carbon thin films. Experimental measurements of the voltage, current waveforms, mass flow rates, and pressure are used as inputs to the model. The magnitude and flow‐rate dependence of the discharge luminosity, film deposition rates, and downstream mass spectra are compared with the model predictions and used to identify the dominant reaction paths. The model uses Monte Carlo simulation of the electron kinetics to predict the electron impact dissociation and ionization rates. These rates provide input for a plug flow chemical kinetics model.