Ion Implantation — problems and perspectives
- 16 July 1978
- journal article
- review article
- Published by Wiley in Physica Status Solidi (a)
- Vol. 48 (1) , 13-22
- https://doi.org/10.1002/pssa.2210480103
Abstract
No abstract availableThis publication has 1 reference indexed in Scilit:
- Diffusion and defect annealing in silicon doped by phosphorus ion implantationPhysica Status Solidi (a), 1970