Correlation of sputtering conditions with electronic conduction in Ta₂O₅ films

• 1 January 1977
• journal article
• Published by American Vacuum Society in Journal of Vacuum Science and Technology
• Vol. 14  (1) , 174-176
• https://doi.org/10.1116/1.569115

Abstract

Keywords

• LEAKAGE CURRENT
• ELECTRIC CONDUCTIVITY
• PHYSICAL PROPERTIES
• CHEMICAL REACTION
• THIN FILM