Automatic monitoring of deposition conditions during rf sputtering of dielectric materials
- 1 June 1975
- Vol. 25 (6) , 265-271
- https://doi.org/10.1016/0042-207x(75)90002-0
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- R.F. sputtered thin films for integrated optical componentsThin Solid Films, 1975
- Novel technique of making graded-refractive-index slab waveguidesElectronics Letters, 1974
- Substrate Cleaning for Integrated Optical WaveguidesApplied Optics, 1973
- Sputtered-glass optical waveguidesElectronics Letters, 1973
- Production and Annealing of Color Centers in rf Sputtered SiO2 FilmsJournal of Applied Physics, 1971