Excimer laser projection lithography on a full-field scanning projection system
- 1 May 1986
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Electron Device Letters
- Vol. 7 (5) , 299-301
- https://doi.org/10.1109/edl.1986.26380
Abstract
Optical projection lithography using an excimer laser light source is demonstrated on a commercial state-of-the-art full-wafer scanning 1x projection system. Images are printed on 125-mm-diameter wafers on a Perkin-Elmer Model 500 projection printer using an XeCl laser operating at 308 nm. Near-vertical image profiles and 1-µm resolution are experimentally demonstrated. The anamorphic optical transformation system necessary to transform the collimated, nearly rectangular excimer laser beam into the arc-shaped, effectively self-luminous illumination required by the projection system is also described.Keywords
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