Deposition of Fluorine‐Doped Silica Layers from a SiCl4 / SiF4 / O 2 Gas Mixture by the Plasma‐CVD Method
- 1 August 1978
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 125 (8) , 1298-1302
- https://doi.org/10.1149/1.2131666