New negative tone resists for subhalf micron lithography
- 1 January 1994
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 23 (1-4) , 321-326
- https://doi.org/10.1016/0167-9317(94)90165-1
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Ultrasensitive chemically amplified resist systemsMicroelectronic Engineering, 1991
- Sensitivity enhancers for chemically amplified resistsPublished by SPIE-Intl Soc Optical Eng ,1990
- O-quinone methides. II. Trapping with production of chromansThe Journal of Organic Chemistry, 1970
- Generation of O-quinone methides in solution. TrimerizationThe Journal of Organic Chemistry, 1970