Enhanced spontaneous emission in hydrogen-plasma-passivatedAlGaAs/GaAs vertical-cavity surface-emitting laser structures grown on Si substrate
- 17 August 2000
- journal article
- Published by Institution of Engineering and Technology (IET) in Electronics Letters
- Vol. 36 (17) , 1462-1464
- https://doi.org/10.1049/el:20001055
Abstract
The effect of hydrogen (H) plasma passivation on a vertical-cavity surface-emitting laser (VCSEL) structure consisting of an active layer of Al0.3Ga0.7As/GaAs multi-quantum-well (MQW) grown on an Si substrate is investigated by photoluminescence (PL) measurement. Significant spontaneous emission enhancement is observed at the cavity mode for the H-plasma-passivated sample. This is attributed to the increased MQW PL emission resulting from the incorporation of hydrogen atoms which passivated the electrical activity of the defects-related nonradiative deep centres and increased the minority carrier lifetime.Keywords
This publication has 4 references indexed in Scilit:
- Spontaneous emission alteration in InGaAs/GaAs vertical cavity surface emitting laser (VCSEL) structuresSemiconductor Science and Technology, 1999
- Effects of H Plasma Passivation on the Optical and Electrical Properties of GaAs-on-SiJapanese Journal of Applied Physics, 1998
- GaAs-Based Vertical-Cavity Surface-Emitting Laser on Si Substrate by Metalorganic Chemical Vapor DepositionJapanese Journal of Applied Physics, 1996
- Biaxially stressed excitons in GaAs/AlGaAs quantum wells grown on Si substratesApplied Physics Letters, 1987