Thermal stability and diffusion studies in the Au and Bi implanted AZ1350 photoresist
- 1 February 1990
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 46 (1) , 350-353
- https://doi.org/10.1016/0168-583x(90)90727-c
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Range measurements and thermal stability study of AZ111 photoresist implanted with Bi ionsJournal of Applied Physics, 1988
- High energy ion beam modification of polymer filmsNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1985
- A Monte Carlo computer program for the transport of energetic ions in amorphous targetsNuclear Instruments and Methods, 1980
- High Dose Ion Implantation into PhotoresistJournal of the Electrochemical Society, 1978