Boron Impurity Profile Tailoring in Silicon by Ion Implantation and Measurement by Glow Discharge Optical Spectroscopy
- 1 September 1976
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 123 (9) , 1388-1391
- https://doi.org/10.1149/1.2133082
Abstract
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