Self-Induced Sputtering during Electron-Beam Evaporation of Ta
- 1 December 1971
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 42 (13) , 5856-5859
- https://doi.org/10.1063/1.1660025
Abstract
A pronounced nonuniformity in films of Ta deposited by electron‐beam evaporation is reported. This effect is explained by the fact that positive Ta ions are generated during evaporation and, due to reflected electrons, the substrate acquires a high negative potential which accelerates the Ta ions and causes sputtering.This publication has 1 reference indexed in Scilit:
- An Ellipsometric Study of Steady-State High Field Ionic Conduction in Anodic Oxide Films on Tantalum, Niobium, and SiliconJournal of the Electrochemical Society, 1966