Electrical and Optical Properties of Ni–P Films
- 1 February 1969
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 40 (2) , 507-511
- https://doi.org/10.1063/1.1657430
Abstract
Results of optical and electrical measurements on Ni–P films are presented, in both as-deposited and annealed films. The films range in thickness from 100 Å to 1 mm and vary in composition from 0%–16% P by weight. The results suggest a model for the structure of these films. For freshly deposited films, the model consists of a three-dimensionally aggregated liquid-like structure with nonmetallic properties. Heat treatment is shown to create a packing tendency followed by crystallization of the films at a relatively high temperature (around 350°C). This results in a nearly metallic film behavior.This publication has 10 references indexed in Scilit:
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