Low Pressure Deposition of Doped SiO2 by Pyrolysis of Tetraethylorthosilicate (TEOS): I . Boron and Phosphorus Doped Films
- 1 November 1987
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 134 (11) , 2923-2931
- https://doi.org/10.1149/1.2100314
Abstract
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