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Atom-probe study of silicide formation at Ni/Si interfaces
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Atom-probe study of silicide formation at Ni/Si interfaces
Atom-probe study of silicide formation at Ni/Si interfaces
ON
Osamu Nishikawa
Osamu Nishikawa
MS
Mezame Shibata
Mezame Shibata
TY
Toshihiko Yoshimura
Toshihiko Yoshimura
EN
Eiichi Nomura
Eiichi Nomura
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1 January 1984
journal article
Published by
American Vacuum Society
in
Journal of Vacuum Science & Technology B
Vol. 2
(1)
,
21-23
https://doi.org/10.1116/1.582908
Abstract
No abstract available
Cited
Cited by 11 articles
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