Dielectric properties of aluminum oxide films
- 1 May 1978
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 49 (5) , 2898-2904
- https://doi.org/10.1063/1.325174
Abstract
This paper presents the results of an investigation on the dielectric properties and discusses the observed ac and dc electrical characteristics of aluminum oxide thin films. ac properties are deduced from the capacitance measurements at intermediate and high frequencies. Measurements indicate the existence of two relaxation mechanisms. Hopping polarization of charge carriers is responsible for the high‐frequency dissipation mechanism. This polarization is influenced by an additional mechanism at low frequencies. dc current‐voltage characteristics are obtained from the steady‐state region of the current transients for various step voltages. They exhibit two distinct types of conduction mechanisms depending on the applied voltage: (a) Ohmic conductivity at low voltages and (b) space‐charge‐limited current (SCLC) at high voltages. Specimens are polarized in the upper limit of the Ohmic region. According to the additional effect of the polarization field in a formed sample with respect to applied field, two alternative types of current transients are posible, which are called ’’same’’ and ’’reverse’’ polarity transients. Relaxation frequencies, obtained by means of the current transient data using Hamon’s equation, depend on the applied electrical field. The polarization field also moderates the relaxation frequencies.This publication has 16 references indexed in Scilit:
- Metallic aluminum particle concentration in aluminum oxide thin filmsJournal of Applied Physics, 1974
- Studies of the electrical properties of bismuth oxide filmsThin Solid Films, 1974
- Thermal conductivity of copper filmsThin Solid Films, 1974
- High-field transport properties of aluminum-embedded aluminum oxide filmsApplied Physics Letters, 1973
- Switching properties and photoconduction in GaSePhysica Status Solidi (a), 1970
- Dispersion of dielectric permittivity due to space-charge polarizationJournal of Physics C: Solid State Physics, 1970
- Structure and properties of dielectric filmsVacuum, 1965
- Low-Frequency Conductivity Due to Hopping Processes in SiliconPhysical Review B, 1961
- Charge Carrier Production and Mobility in Anthracene CrystalsPhysical Review B, 1960
- Photocurrent, Space-Charge Buildup, and Field Emission in Alkali Halide CrystalsPhysical Review B, 1953