The observation of pseudodiffusion of nickel in single-crystal silicon by in-depth Auger electron spectroscopy
- 1 August 1977
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 45 (1) , 141-145
- https://doi.org/10.1016/0040-6090(77)90215-2
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
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- Structure and growth kinetics of Ni2Si on siliconThin Solid Films, 1975
- Palladium silicide formation observed by Auger electron spectroscopyApplied Physics Letters, 1974
- Dislocation Etch for (100) Planes in SiliconJournal of the Electrochemical Society, 1972
- Dissociative Diffusion of Nickel in Silicon and Self-Diffusion of SiliconJapanese Journal of Applied Physics, 1967
- Diffusion of Nickel in SiliconPhysica Status Solidi (b), 1967
- Behavior of Nickel as an Impurity in SiliconJapanese Journal of Applied Physics, 1964