Photoemission from clean and oxygen-covered ultrafine nickel particles

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Abstract
Ultrafine nickel particles are produced in ultrapure helium. The measured photothreshold and photoelectric yield of clean nickel particles are found to be in fairly good agreement with theoretical calculations based on a three-step model using density-of-states data of a flat surface. The photothreshold change due to oxygen adsorption on nickel particles was measured. It shows qualitatively the same behavior as on a flat surface but with a sticking coefficient that is smaller by a factor of 500 compared with the one on a flat Ni(110) surface. The formation of NiO is found to influence the experiment at high surface coverage.