Growth and Size Control of Amorphous Silicon Quantum Dots Using SiH4/N2 Plasma

• 25 November 2002
• journal article
• research article
• Published by Wiley in Chemical Vapor Deposition
• Vol. 8  (6) , 254-256
• https://doi.org/10.1002/1521-3862(20021203)8:6<254::aid-cvde254>3.0.co;2-s

Abstract

Keywords

• PLASMA
• QUANTUM DOTS
• SILICON NITRIDES
• SILICON, AMORPHOUS