Effects on profile depth of changes in the thickness of the photoresist layers
- 1 April 1994
- journal article
- Published by Optica Publishing Group in Applied Optics
- Vol. 33 (10) , 2043-2047
- https://doi.org/10.1364/ao.33.002043
Abstract
Optics InfoBase is the Optical Society's online library for flagship journals, partnered and copublished journals, and recent proceedings from OSA conferences.Keywords
This publication has 6 references indexed in Scilit:
- Fabrication of thin periodic structures in photoresist: a modelApplied Optics, 1976
- Characteristics of Relief Phase Holograms Recorded in PhotoresistsApplied Optics, 1974
- Nonlinearities of Photopolymer Holographic Recording MaterialsApplied Optics, 1972
- Phase Holograms of Diffuse ObjectsJournal of the Optical Society of America, 1970
- HOLOGRAPHY Embossed Hologram Motion Pictures for Television PlaybackApplied Optics, 1970
- Spatial Phase Modulation of Wavefronts in Spatial Filtering and HolographyJournal of the Optical Society of America, 1966