Chemical Mechanical Polishing (CMP) in Magnetic Float Polishing (MFP) of Advanced Ceramic (Silicon Nitride) and Glass (Silicon Dioxide)
- 1 June 2001
- journal article
- Published by Trans Tech Publications, Ltd. in Key Engineering Materials
- Vol. 202-203, 1-14
- https://doi.org/10.4028/www.scientific.net/kem.202-203.1
Abstract
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