Rapid plasma etching of cubic SiC using NF3/O2 gas mixtures
- 30 April 1997
- journal article
- Published by Elsevier in Materials Science and Engineering: B
- Vol. 46 (1-3) , 160-163
- https://doi.org/10.1016/s0921-5107(96)01969-1
Abstract
No abstract availableKeywords
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