Mechanism of Growth of Silica Monolayer and Generation of Acidity by Chemical Vapor Deposition of Tetramethoxysilane on Alumina
- 1 August 1994
- journal article
- Published by American Chemical Society (ACS) in The Journal of Physical Chemistry
- Vol. 98 (31) , 7647-7652
- https://doi.org/10.1021/j100082a041