A single-source precursor to titanium nitride thin films. Evidence for the intermediacy of imido complexes in the chemical vapor deposition process
- 1 January 1992
- journal article
- Published by American Chemical Society (ACS) in Journal of the American Chemical Society
- Vol. 114 (3) , 1095-1097
- https://doi.org/10.1021/ja00029a053
Abstract
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