Determination of the stress profile in ion implanted garnets
- 1 November 1981
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Magnetics
- Vol. 17 (6) , 2917-2919
- https://doi.org/10.1109/tmag.1981.1061494
Abstract
No abstract availableThis publication has 8 references indexed in Scilit:
- Ion implantation profiles in bubble garnetsThin Solid Films, 1982
- Magnetic state of ion implanted layer in garnet bubble film: Temperature dependence studyIEEE Transactions on Magnetics, 1981
- Ferromagnetic resonance study of the anisotropy profile in implanted bubble garnetsJournal of Applied Physics, 1979
- X-ray determination of strain and damage distributions in ion-implanted layersApplied Physics Letters, 1979
- Ion implant profiles in garnet filmsJournal of Applied Physics, 1979
- Reliable propagation of magnetic bubbles with 8 μm period ion implanted propagation patternsJournal of Applied Physics, 1979
- Crystalline and magnetic properties of an ion-implanted layer in bubble garnet filmsJournal of Applied Physics, 1978
- Calculation of stress in electrodeposits from the curvature of a plated stripJournal of Research of the National Bureau of Standards, 1949