Bias stress in organic thin-film transistors and logic gates
- 20 August 2001
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 79 (8) , 1124-1126
- https://doi.org/10.1063/1.1394718
Abstract
Threshold voltage instabilities of all-organic thin-film transistors are investigated as a function of stress time and stress bias. The dominant effect is a positive threshold shift for negative gate bias stress which is explained by mobile ions drifting in the insulator when a gate field is applied. Trapping of charge carriers at the semiconductor–insulator interface plays only a minor role. Furthermore, we investigate the stress behavior of a basic logic element, an inverter. In comparison to a single transistor, we observe improved stability which arises from partial compensation of the parametric shifts during operation.Keywords
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