Simple algebraic description of photoresist exposure and contrast enhancement

1 June 1986

journal article
Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Electron Device Letters

Vol. 7 (6) , 383-386
https://doi.org/10.1109/EDL.1986.26408

Abstract

Equations are given that allow the facile calculation of transmittance and concentration profiles for solid photosensitive systems of arbitrary optical absorbance, including absorbing photoproducts and medium. The results are applied to the measurement of resist exposure parameters, the determination of light intensity for a wafer stepper (dosimetry), and the analysis of contrast enhancement materials and other photobleaching image modification techniques.

Keywords

RESISTS
OPTICAL FILMS
SOLIDS
OPTICAL ATTENUATORS
IMAGE ANALYSIS
EXTINCTION COEFFICIENTS
COMPUTATIONAL MODELING
INTEGRAL EQUATIONS
NONLINEAR OPTICS
DOSIMETRY

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