Efficient sputtering in a cold-cathode discharge in magnetron geometry

1 January 1967

journal article
Published by Institute of Electrical and Electronics Engineers (IEEE) in Proceedings of the IEEE

Vol. 55 (12) , 2179-2180
https://doi.org/10.1109/PROC.1967.6113

Abstract

Efficient sputtering has been achieved in a cold-cathode discharge in a magnetron geometry under a strong magnetic field. The sputtering may be readily used for the production of thin-film microcircuits. The mechanism of the sputtering is discussed in connection with the mode of discharge.

Keywords

SPUTTERING
GEOMETRY
CATHODES
ELECTRONS
EFFECTIVE MASS
MAGNETIC FIELDS
MAGNETIC ANISOTROPY
PERPENDICULAR MAGNETIC ANISOTROPY
SURFACE DISCHARGES
GERMANIUM

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