In Situ Monitoring of Film Deposition Using He-Ne Laser System

Abstract
Surface acoustic wave transducers with 4000Aå linewidth interdigital electrodes have been fabricated by photolithographic contact printing using conformable photomasks and AZ 1350H photoresist. The exposure time could be varied over a factor of three, indicating that line broadening due to diffraction is suppressed either by the optical nonlinearity or by the exposure development characteristics of the photoresist, or both.

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