KrF(B) quenching by He, Ne, Xe, and NF3
- 1 November 1978
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 49 (11) , 5368-5372
- https://doi.org/10.1063/1.324505
Abstract
Flash photolysis of KrF2 at 193 nm has been utilized to directly measure the quenching rate constants of KrF(B) molecules by He, Ne, Xe, and NF3. Investigation of the large rate constant measured for the KrF(B)+Xe reaction (≳10−9 cm3 sec−1) verified the XeF(B) state to be a product.This publication has 18 references indexed in Scilit:
- New quenching rates applicable to the KrF laserApplied Physics Letters, 1978
- The radiative lifetime and quenching of KrFApplied Physics Letters, 1978
- Formation and quenching of XeF* in Ne/Xe/F2 mixturesApplied Physics Letters, 1978
- Formation and quenching processes in e–beam-pumped Kr/F2 mixturesApplied Physics Letters, 1978
- Lifetime and collisional quenching measurements of XeF*(B) by photolysis of XeF_2Optics Letters, 1978
- Dominant formation and quenching processes in-beam pumped ArF and KrF lasersPhysical Review A, 1977
- The influence of diluent gas on the XeF laserApplied Physics Letters, 1977
- Vacuum-ultraviolet photolysis of XeF2: XeF(B) fluorescence and quenchingChemical Physics Letters, 1977
- Formation and quenching of XeF and KrF electronic excited statesApplied Physics Letters, 1976
- A new method for the preparation of krypton difluorideJournal of Fluorine Chemistry, 1975