Model for Exposure of Electron-Sensitive Resists

• 1 November 1973
• journal article
• Published by American Vacuum Society in Journal of Vacuum Science and Technology
• Vol. 10  (6) , 1056-1059
• https://doi.org/10.1116/1.1318466

Abstract

Keywords

• MODEL
• STRUCTURE
• ELECTRON SENSITIVE
• SENSITIVE RESISTS
• CONTOURS
• BEAM
• EXPOSURE FOR AN ELECTRON
• MATHEMATICAL
• VANISHINGLY
• COATED