The influence of post-exposure bake on linewidth control for the resist system RAY-PN (AZ PN 100) in x-ray mask fabrication
- 1 November 1991
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 9 (6) , 3392-3398
- https://doi.org/10.1116/1.585347
Abstract
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