Influence of biased magnetron deposition parameters on amorphous Gd–Co–Cu properties

1 January 1977

journal article
Published by American Vacuum Society in Journal of Vacuum Science and Technology

Vol. 14 (1) , 138-140
https://doi.org/10.1116/1.569105

Abstract

Biased magnetron sputtering has been used to deposit amorphous GdCoCu films from a Gd15Co38Cu47 target. The effects of target current, sputtering pressure, and substrate-bias voltage have been determined. The uniaxial anisotropy energy Ku may be varied from 0.07 × 105 erg/cm3 to 4.0 × 105 erg/cm3 while the quality factor Q=Ku/(2πM2) may be varied from 0.6 to 7.9. In varying these parameters the film compositions are maintained at approximately the target composition, while similar parameter variations in diode sputtering engender compositional changes far greater. Thus, it is shown that magnetron sputtering offers a control of film properties that is unattainable with other deposition techniques.

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