The investigation of double layers in semiconductor technology
- 30 June 1970
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 13 (6) , 807-814
- https://doi.org/10.1016/0038-1101(70)90067-5
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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- Distribution of sodium in silicon nitrideSolid-State Electronics, 1969
- Nondestructive thickness measurement of thin films on microstructuresSolid-State Electronics, 1968
- Optical thickness measurement of SiO2Si3N4 films on siliconSolid-State Electronics, 1967
- Non-destructive measurement of glass on silicon dioxide through near-infrared (NIR) interferenceSolid-State Electronics, 1966
- Computational Method for Determining n and k for a Thin Film from the Measured Reflectance, Transmittance, and Film ThicknessApplied Optics, 1966