An X‐Ray Photoelectron Spectroscopy Study of CF 4 / H 2 Reactive Ion Etching Residue on Silicon
- 1 December 1987
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 134 (12) , 3122-3125
- https://doi.org/10.1149/1.2100353
Abstract
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