Trench process with HBr chemistry in ripe
- 1 March 1991
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 13 (1-4) , 425-428
- https://doi.org/10.1016/0167-9317(91)90125-w
Abstract
No abstract availableThis publication has 1 reference indexed in Scilit:
- Fast anisotropic etching of silicon in an inductively coupled plasma reactorApplied Physics Letters, 1989