Negative Electron Resists for Direct Device Lithography: II . Poly(Glycidyl Methacrylate‐Co‐3‐Chlorostyrene)—Lithographic Performance
- 1 October 1979
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 126 (10) , 1703-1708
- https://doi.org/10.1149/1.2128780
Abstract
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