Alumina deposition by activated reactive evaporation
- 1 January 1977
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 40, 211-216
- https://doi.org/10.1016/0040-6090(77)90120-1
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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- Structure and microhardness relationships in Ti, Zr and Hf-3Zr carbide deposits synthesized by activated reactive evaporationThin Solid Films, 1974
- Activated Reactive Evaporation Process for High Rate Deposition of CompoundsJournal of Vacuum Science and Technology, 1972
- Al 2 O 3 Films Prepared by Electron-Beam Evaporation of Hot-Pressed Al2O3 in Oxygen AmbientJournal of Vacuum Science and Technology, 1971
- Preliminary investigations of Reactively Evaporated Aluminum Oxide Films on SiliconJournal of the Electrochemical Society, 1969
- Electrical Properties of Evaporated Aluminum Oxide FilmsJournal of the Electrochemical Society, 1962