Polymer structure effect on dissolution characteristics and acid diffusion in chemically amplified deep ultraviolet resists
- 1 November 1997
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 15 (6) , 2541-2544
- https://doi.org/10.1116/1.589681
Abstract
No abstract availableThis publication has 13 references indexed in Scilit:
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