Silver recoil yield resulting from krypton implantation
- 1 July 1981
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 52 (7) , 4600-4603
- https://doi.org/10.1063/1.329337
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- An application of the Boltzmann transport equation to ion range and damage distributions in multilayered targetsJournal of Applied Physics, 1980
- The effects of the recoil-implanted oxygen in Si on the electrical activation of As after through-oxide implantationJournal of Applied Physics, 1979
- Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline TargetsPhysical Review B, 1969