40 nm gate length ultra-thin SOI n-MOSFETs with a backside conducting layer
- 27 November 2002
- conference paper
- Published by Institute of Electrical and Electronics Engineers (IEEE)
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- A 7.9/5.5 psec room/low temperature SOI CMOSPublished by Institute of Electrical and Electronics Engineers (IEEE) ,2002
- Scaling the Si MOSFET: from bulk to SOI to bulkIEEE Transactions on Electron Devices, 1992
- Calculated threshold-voltage characteristics of an XMOS transistor having an additional bottom gateSolid-State Electronics, 1984