High rate deposition of TiO2 by DC sputtering of the TiO2−X target
- 2 July 2001
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 392 (2) , 169-173
- https://doi.org/10.1016/s0040-6090(01)01023-9
Abstract
No abstract availableKeywords
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