At-wavelength characterization of an extreme ultraviolet camera from low to mid-spatial frequencies with a compact laser plasma source
- 1 November 1997
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 15 (6) , 2462-2466
- https://doi.org/10.1116/1.589667
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Direct aerial image measurements to evaluate the performance of an extreme ultraviolet projection lithography systemJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1996
- Initial results from an extreme ultraviolet interferometer operating with a compact laser plasma sourceJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1996
- Phase-measuring interferometry using extreme ultraviolet radiationJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1995
- Development of a laboratory extreme-ultraviolet lithography toolPublished by SPIE-Intl Soc Optical Eng ,1994
- Method for Evaluating Lateral Shearing InterferogramsApplied Optics, 1974