Dependence of thin-film microstructure on deposition rate by means of a computer simulation
- 1 October 1985
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 58 (7) , 2573-2576
- https://doi.org/10.1063/1.335885
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
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- The Mechanisms of Surface Self DiffusionZeitschrift für Physikalische Chemie, 1972
- Effect of vapour incidence angles on profile and properties of condensed filmsThin Solid Films, 1972