Ion beam impact and penetration of polymethyl methacrylate
- 1 October 1985
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 58 (7) , 2534-2538
- https://doi.org/10.1063/1.335932
Abstract
No abstract availableThis publication has 10 references indexed in Scilit:
- Some effects at ion beam modification of polymethyl methacrylateVacuum, 1984
- Experiments on the sputtering of group VI elementsNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1984
- Sputtering of a polymer layer deposited on metal substratesJournal of Applied Physics, 1983
- Erosion of polymer thin films during ion bombardmentJournal of Vacuum Science & Technology A, 1983
- Ion beam exposure characteristics of resists: Experimental resultsJournal of Applied Physics, 1982
- Catastrophic sputtering of sulfur by heliumRadiation Effects and Defects in Solids, 1982
- Ion beam exposure profiles in PMMA–computer simulationJournal of Vacuum Science and Technology, 1981
- Polymethyl methacrylate sensitivity variation versus the electronic stopping power at ion lithography exposureApplied Physics Letters, 1981
- A Monte Carlo computer program for the transport of energetic ions in amorphous targetsNuclear Instruments and Methods, 1980
- Ion Beam Exposure of Resist MaterialsJournal of the Electrochemical Society, 1979