Super: A bmicron ositive dry tch esist; a candidate for DUV-lithography
- 1 May 1989
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 9 (1-4) , 561-566
- https://doi.org/10.1016/0167-9317(89)90120-2
Abstract
No abstract availableThis publication has 1 reference indexed in Scilit:
- Diffusion in glassy polymersJournal of Polymer Science Part C: Polymer Symposia, 1966