Recent Progress in ArF Lithography for the 100nm Node.

• 1 January 2001
• journal article
• Published by Technical Association of Photopolymers, Japan in Journal of Photopolymer Science and Technology
• Vol. 14  (3) , 333-340
• https://doi.org/10.2494/photopolymer.14.333

Abstract

Keywords

• RECENT PROGRESS
• 100NM NODE
• ARF LITHOGRAPHY
• PROGRESS IN ARF