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Electrical characteristics of ion implanted boron layers in silicon
Home
Publications
Electrical characteristics of ion implanted boron layers in silicon
Electrical characteristics of ion implanted boron layers in silicon
JS
J. M. Shannon
J. M. Shannon
RT
R. Tree
R. Tree
GG
G. A. Gard
G. A. Gard
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15 January 1970
journal article
Published by
Canadian Science Publishing
in
Canadian Journal of Physics
Vol. 48
(2)
,
229-235
https://doi.org/10.1139/p70-030
Abstract
No abstract available
Keywords
ION IMPLANTATION
Cited
Cited by 10 articles
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