Thin Dielectric Layers Technology using Vacuum Deposition with Piezoelectric Crystal Rate Control

1 August 1965

journal article
Published by Optica Publishing Group in Applied Optics

Vol. 4 (8) , 993-997
https://doi.org/10.1364/ao.4.000993

Abstract

The method described, used to prepare thin dielectric layers, employs a programmed deposition rate control system based on the frequency variations of a piezoelectric quartz crystal on which a layer is deposited simultaneously with the required coating. The most important parameters of the system are discussed as well as the results achieved with magnesium fluoride and silicon monoxide layers of thicknesses from 1500 Å to 3000 Å.

Keywords

CRYSTAL
PIEZOELECTRIC
FREQUENCY
FLUORIDE
VACUUM
DIELECTRIC
SIMULTANEOUSLY
THICKNESSES
MONOXIDE

This publication has 1 reference indexed in Scilit:

Verwendung von Schwingquarzen zur W gung d nner Schichten und zur Mikrow gung
The European Physical Journal A, 1959